DocumentCode
330714
Title
Radical Interactions With Electrode Surfaces In Parallel-Plate-Type RIE
Author
Morishita, S. ; Hayashi, H. ; Tatsumi, T. ; Noda, S. ; Okigawa, M. ; Hikosaka, Y. ; Inoue, M.
Author_Institution
Association of Super-Advanced Electronics Technologies (ASET)
fYear
1998
fDate
13-16 July 1998
Firstpage
217
Lastpage
218
Keywords
Electrodes; Electrons; Etching; Plasma applications; Plasma chemistry; Plasma devices; Plasma materials processing; Plasma properties; Plasma temperature; Polymers;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.730052
Filename
730052
Link To Document