DocumentCode

330716

Title

Micro-Etching Technology Of High Aspect Ratio Framework For Electronic Devices

Author

Cho, Y.R. ; Oh, J.Y. ; Kim, H.S. ; Jeong, H.S.

Author_Institution

Electronic Materials Lab., Institute for Advanced Engineering

fYear

1998

fDate

13-16 July 1998

Firstpage

221

Lastpage

222

Keywords

Aluminum oxide; Displays; Etching; Glass; Impurities; Lithography; Mechanical systems; Microelectronics; Microstructure; Vacuum systems;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.730054

Filename

730054