• DocumentCode
    3307169
  • Title

    In-situ synthesis and crystal growth of high purity InP

  • Author

    Bliss, D.F. ; Hilton, R.M. ; Adamski, J.A.

  • Author_Institution
    Rome Lab., Hanscom AFB, MA, USA
  • fYear
    1992
  • fDate
    21-24 April 1992
  • Firstpage
    262
  • Lastpage
    265
  • Abstract
    High-purity indium phosphide crystals have been produced by an in-situ synthesis and growth process. The in-situ process has several advantages over the two-step process of compounding and growing in separate furnaces. A stoichiometric compound is formed within a few minutes by injecting phosphorus directly into the melt followed by crystal growth of InP without exposure to potential contamination outside the furnace environment. The time required for the in-situ process is a few hours to produce a 1 kg crystal. The authors have investigated the temperature gradients inside the injector during synthesis. A mechanism and apparatus to produce high-purity crystals by the in-situ process are described. Such InP crystals are shown to produce exciton emission peaks in photoluminescence spectra which are not generally found in bulk crystals grown by the two-step process. Since in-situ InP has a low background level of impurities, it is possible to produce semi-insulating material with a low concentration (<5*10/sup 15/ cm/sup -3/) of iron dopant.<>
  • Keywords
    III-V semiconductors; crystal growth from melt; excitons; indium compounds; luminescence of inorganic solids; photoluminescence; semiconductor growth; InP; InP:Fe; crystal growth; exciton emission peaks; growth process; high-purity crystals; in-situ synthesis; melt; photoluminescence spectra; semiinsulating material; stoichiometric compound; Contamination; Crystals; Excitons; Furnaces; Impurities; Indium phosphide; Iron; Photoluminescence; Semiconductor materials; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 1992., Fourth International Conference on
  • Conference_Location
    Newport, RI, USA
  • Print_ISBN
    0-7803-0522-1
  • Type

    conf

  • DOI
    10.1109/ICIPRM.1992.235589
  • Filename
    235589