Title :
Effects Of Etch-Induced Damage And Contamination On The Physical And Electrical Properties Of Cobalt Silicides
Author :
Kim, H.S. ; Jang, J.W. ; Lee, Y.H. ; Yoon, J.K. ; Yeom, G.Y.
Author_Institution :
Sung Kyun Kwan University
Keywords :
Cleaning; Cobalt; Contacts; Contamination; Etching; Plasma applications; Plasma properties; Plasma temperature; Silicides; Silicon;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730055
