Effects Of Etch-Induced Damage And Contamination On The Physical And Electrical Properties Of Cobalt Silicides

Author

Kim, H.S. ; Jang, J.W. ; Lee, Y.H. ; Yoon, J.K. ; Yeom, G.Y.

Author_Institution

Sung Kyun Kwan University

fYear

1998

fDate

13-16 July 1998

Firstpage

223

Lastpage

225

Keywords

Cleaning; Cobalt; Contacts; Contamination; Etching; Plasma applications; Plasma properties; Plasma temperature; Silicides; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

DOI

10.1109/IMNC.1998.730055

Filename

730055

Link To Document