DocumentCode

330718

Title

Study Of Self-Limiting Etching Behavior In Wet Isotropic Etching Of Silicon

Author

Han, C.-H. ; Kim, E.S.

Author_Institution

University of Hawaii at Manoa

fYear

1998

fDate

13-16 July 1998

Firstpage

226

Lastpage

227

Keywords

Adhesives; Hafnium; Hydrogen; Lenses; Microelectromechanical systems; Micromechanical devices; Rough surfaces; Silicon; Surface roughness; Wet etching;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.730056

Filename

730056