Title :
Effect Of Post Plasma Treatment On Reliability Of ECRCVD SioF Films
Author :
Lee, Seoghyeong ; Yang, Sung-Hoon ; Park, Jeongwon ; Park, Jong-Wan
Author_Institution :
Hanyang University
Keywords :
Dielectric constant; Optical films; Plasma applications; Plasma chemistry; Plasma density; Plasma devices; Plasma measurements; Plasma properties; Radio frequency; Surface treatment;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730058
