• DocumentCode
    330720
  • Title

    Effect Of Post Plasma Treatment On Reliability Of ECRCVD SioF Films

  • Author

    Lee, Seoghyeong ; Yang, Sung-Hoon ; Park, Jeongwon ; Park, Jong-Wan

  • Author_Institution
    Hanyang University
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    231
  • Lastpage
    232
  • Keywords
    Dielectric constant; Optical films; Plasma applications; Plasma chemistry; Plasma density; Plasma devices; Plasma measurements; Plasma properties; Radio frequency; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.730058
  • Filename
    730058
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330720