DocumentCode :
330723
Title :
Facet Formation In Selectively Overgrown Silicon By Reduced Pressure Chemical Vapor Deposition
Author :
Song, S. ; Lee, S. ; Ryum, B. ; Yoon, E.
Author_Institution :
Seoul National University
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
240
Lastpage :
241
Keywords :
Application specific integrated circuits; Chemical technology; Chemical vapor deposition; Diffraction; Fabrication; Integrated circuit technology; Isolation technology; Materials science and technology; Pattern analysis; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730061
Filename :
730061
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330723
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