Title :
Structural And Compositional Evolution Of SiO/sub 2/ Aerogel Film By Oxygen Plasma Treatment
Author :
Kim, Hong-Ryul ; Park, Hyung-Ho
Author_Institution :
Yonsei University
Keywords :
Chemicals; Leakage current; Oxygen; Plasma chemistry; Plasma density; Plasma properties; Plasma temperature; Semiconductor films; Surface morphology; Surface treatment;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730062
