Title :
MoSi(N) As A Diffusion Barrier Between Cu And Si
Author :
Park, J.Y. ; Lee, Y.H. ; Bae, J.W. ; Yeom, G.Y. ; Song, J.H.
Author_Institution :
Sung Kyun Kwan University
Keywords :
Annealing; Conductivity; Crystallization; Electrical resistance measurement; Inorganic materials; Magnetic materials; Semiconductor materials; Silicon; Sputtering; Temperature;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.730065
