DocumentCode
330727
Title
MoSi(N) As A Diffusion Barrier Between Cu And Si
Author
Park, J.Y. ; Lee, Y.H. ; Bae, J.W. ; Yeom, G.Y. ; Song, J.H.
Author_Institution
Sung Kyun Kwan University
fYear
1998
fDate
13-16 July 1998
Firstpage
248
Lastpage
250
Keywords
Annealing; Conductivity; Crystallization; Electrical resistance measurement; Inorganic materials; Magnetic materials; Semiconductor materials; Silicon; Sputtering; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.730065
Filename
730065
Link To Document