DocumentCode :
330733
Title :
The Implementation Of Sub-150nm Contact Hole Pattern By Resist Flow Process
Author :
Kim, Jin-Soo ; Choi, Chang-II ; Bok, CheoCKyu ; Ahn, Chang-Nam ; Kim, Hyeong-Soo ; Baik, Ki-Ho
Author_Institution :
Hyundai Electronics Industries Co., Ltd.
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
259
Lastpage :
260
Keywords :
Charge carrier processes; Electron beams; Electronics industry; Image motion analysis; Inspection; Lithography; Mass production; Resists; Temperature; Throughput;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730071
Filename :
730071
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330733
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