DocumentCode :
330738
Title :
Mechanism Of The Fluoroscopic Measurement Of Sub-Surface Structure Using High Energy Scanning Electron Microscope
Author :
Kotera, M. ; Yamaguchi, K.
Author_Institution :
Osaka Institute of Technology
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
269
Lastpage :
270
Keywords :
Charge carrier processes; Electron beams; Electron emission; Energy measurement; Power engineering and energy; Resists; Scanning electron microscopy; Semiconductor device measurement; Shape; Surface topography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730076
Filename :
730076
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330738
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