DocumentCode :
330764
Title :
Silicon Containing Photoresists For ArF Excimer Laser Lithography
Author :
Kim, Young-Dae ; Park, Sang-Jin ; Haiwon Lee ; Lee, Haiwon ; Dong-Won Jung ; Sang-Jun Choi
Author_Institution :
Hanyang University
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
323
Lastpage :
324
Keywords :
Chemical lasers; Chemistry; Lithography; Microelectronics; Optical materials; Polymers; Research and development; Resists; Semiconductor lasers; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.730103
Filename :
730103
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=330764
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