مرکز منطقه ای اطلاع رساني علوم و فناوري - Sub-10-nm EB Lithography Using Poly(/spl alpha/-methylstyrene) Resist of Molecular Weight 650

DocumentCode :

330765

Title :

Sub-10-nm EB Lithography Using Poly(/spl alpha/-methylstyrene) Resist of Molecular Weight 650

Author :

Manako, S. ; Fujita, J. ; Tanigaki, K. ; Ochiai, Y. ; Nomura, E.

Author_Institution :

NEC Corporation

fYear :

1998

fDate :

13-16 July 1998

Firstpage :

325

Lastpage :

326

Keywords :

Chemicals; Electrons; Fabrication; Laboratories; Lithography; Nanoscale devices; National electric code; Resists; Substrates; Transistors;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location :

Kyoungju, South Korea

Print_ISBN :

4-930813-83-2

Type :

conf

DOI :

10.1109/IMNC.1998.730104

Filename :

730104

Link To Document :