Sub-10-nm EB Lithography Using Poly(/spl alpha/-methylstyrene) Resist of Molecular Weight 650

Author

Manako, S. ; Fujita, J. ; Tanigaki, K. ; Ochiai, Y. ; Nomura, E.

Author_Institution

NEC Corporation

fYear

1998

fDate

13-16 July 1998

Firstpage

325

Lastpage

326

Keywords

Chemicals; Electrons; Fabrication; Laboratories; Lithography; Nanoscale devices; National electric code; Resists; Substrates; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

DOI

10.1109/IMNC.1998.730104

Filename

730104

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