Charge Reducing Effect Of Chemically Amplified Resist

Author

Nakasugi, Tetsuro ; Magoshi, Shunko ; Sugihara, Kazuyoshi ; Saito, Satoshi ; Kihara, Naoko

Author_Institution

Toshiba Corp.

fYear

1998

fDate

13-16 July 1998

Firstpage

338

Lastpage

339

Keywords

Chemicals; Conductivity; Electron beams; Large scale integration; Lithography; Microelectronics; Polymer films; Resins; Resists; Surface resistance;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

DOI

10.1109/IMNC.1998.730111

Filename

730111

Link To Document