مرکز منطقه ای اطلاع رساني علوم و فناوري - Charge Reducing Effect Of Chemically Amplified Resist

DocumentCode :

330772

Title :

Charge Reducing Effect Of Chemically Amplified Resist

Author :

Nakasugi, Tetsuro ; Magoshi, Shunko ; Sugihara, Kazuyoshi ; Saito, Satoshi ; Kihara, Naoko

Author_Institution :

Toshiba Corp.

fYear :

1998

fDate :

13-16 July 1998

Firstpage :

338

Lastpage :

339

Keywords :

Chemicals; Conductivity; Electron beams; Large scale integration; Lithography; Microelectronics; Polymer films; Resins; Resists; Surface resistance;

fLanguage :

English

Publisher :

ieee

Conference_Titel :

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location :

Kyoungju, South Korea

Print_ISBN :

4-930813-83-2

Type :

conf

DOI :

10.1109/IMNC.1998.730111

Filename :

730111

Link To Document :