DocumentCode

330773

Title

Sub-Quarter-Micron PT Etching Technology Using Round Head EB Resist

Author

Yunogami, Takashi ; Kumihashi, Takao

Author_Institution

Hitachi Ltd.

fYear

1998

fDate

13-16 July 1998

Firstpage

340

Lastpage

341

Keywords

Anisotropic magnetoresistance; Argon; Fluid flow measurement; Lithography; Magnetic heads; Power measurement; Radio frequency; Resists; Shape; Sputter etching;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.730112

Filename

730112