DocumentCode :
3308106
Title :
Analog and digital performance of MISFETs on p- and n-GaInAs
Author :
Schulte, F. ; Werres, C. ; Splettstosser, J. ; Schmitz, D. ; Tuzinski, R. ; Heime, K. ; Beneking, H.
Author_Institution :
AIXTRON GmbH, Aachen, Germany
fYear :
1992
fDate :
21-24 April 1992
Firstpage :
503
Lastpage :
506
Abstract :
GaInAs MISFETs with pyrolytic SiO/sub 2/ isolator on n- and p-GaInAs have been investigated with regard to analog and digital performance. The 1.7- mu m gate length MISFETs on n-GaInAs and p-GaInAs have transconductances of 100 mS/mm and 40 mS/mm, cutoff frequencies (f/sub T/) of 14 GHz and 2 GHz, and maximum frequencies of oscillation (f/sub max/) of 18 GHz and 6 GHz, respectively. Due to the self-aligned process and the better carrier confinement, the MISFETs on p-GaInAs show higher f/sub max//f/sub T/ values. An inverter on p-GaInAs with a high static voltage gain of -13.5 and high noise margin has been integrated to a 31-stage ring oscillator, proving the reproducibility of the technology with a pyrolytic SiO/sub 2/ isolator. The delay time of one stage is 6 ns, corresponding to an intrinsic frequency of 200 MHz, which shows that the operation point of the ring oscillator is not optimized.<>
Keywords :
III-V semiconductors; aluminium; field effect integrated circuits; gallium arsenide; indium compounds; insulated gate field effect transistors; logic gates; silicon compounds; solid-state microwave devices; 1.7 micron; 100 mS/mm; 14 GHz; 18 GHz; 2 GHz; 31-stage ring oscillator; 40 mS/mm; 6 GHz; 6 ns; GaInAs-SiO/sub 2/-Al; MISFET; analog performance; carrier confinement; cutoff frequencies; delay time; digital performance; gate length; inverter; maximum frequencies of oscillation; noise margin; pyrolytic SiO/sub 2/ isolator; self-aligned process; semiconductors; static voltage gain; transconductances; Carrier confinement; Cutoff frequency; Delay effects; Inverters; Isolation technology; Isolators; MISFETs; Reproducibility of results; Ring oscillators; Voltage-controlled oscillators;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1992., Fourth International Conference on
Conference_Location :
Newport, RI, USA
Print_ISBN :
0-7803-0522-1
Type :
conf
DOI :
10.1109/ICIPRM.1992.235641
Filename :
235641
Link To Document :
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