A new method of birefringence measurement to obtain stress field using photoelasticity

Author

Gomi, Kenji ; Shimizu, Kengo ; Suzuki, Hayato ; Gohira, Shinichi ; Niitsu, Yasushi ; Ichinose, Kensuke

Author_Institution

Dept. of Mech. Eng., Tokyo Denki Univ., Japan

fYear

2005

fDate

11-14 Dec. 2005

Firstpage

129

Lastpage

131

Abstract

This paper reports on a new method for measuring of birefringence to obtain stress fields using laser photoelasticity. This method provides for the measurements of magnitude and the angular orientation of the fast axis of the birefringence without the necessity of specimen rotation. In order to check the validity of the method, birefringence of two crystal wave plates with nominal retardation magnitudes of 79.1 and 10.0 nanometers were examined. Good agreement was obtained between measured values and the nominal values. The cause of the difference between experimental results and nominal values is also discussed.

Keywords

birefringence; measurement by laser beam; optical materials; optical variables measurement; photoelasticity; stress analysis; birefringence measurement; crystal wave plates; laser photoelasticity; stress field; Birefringence; Geometrical optics; High speed optical techniques; Laser beams; Optical modulation; Optical retarders; Optical sensors; Photoelasticity; Stress measurement; Thermal stresses;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronics Materials and Packaging, 2005. EMAP 2005. International Symposium on

Print_ISBN

1-4244-0107-0

Type

conf

DOI

10.1109/EMAP.2005.1598248

Filename

1598248