DocumentCode :
3309266
Title :
Development of the embedded LSI technology in PALAP™
Author :
Kamiya, H. ; Miyake, T. ; Kobayashi, H. ; Kondo, K.
Author_Institution :
DENSO Corp., Aichi, Japan
fYear :
2005
fDate :
11-14 Dec. 2005
Firstpage :
183
Lastpage :
186
Abstract :
We are developing the embedded LSI technology in PALAP™; PWB developed by DENSO CORP.; made from plural patterned thermoplastic resin films and fabricated with one time hot press process. To understand the behavior of the resin, via, copper land, LSI and so on during press process, a new strong coupling analysis system was developed. Using this system, we analyzed the velocity of resin around the LSI, when embedding the LSI. As a result, it was cleared that the resin under the LSI flowed toward the clearance, and the velocity sharply increased at peripheral position of the LSI. Practically, via under the LSI radially moved from the LSI central part according to the velocity distribution. It is not concerned with the positional relationship between the LSI bump and via that the clearance is different from each other at the left right of the LSI, because the LSI moves with the resin at the same timing and velocity.
Keywords :
integrated circuit interconnections; large scale integration; resins; PALAP technology; coupling analysis system; embedded LSI technology; hot press process; resin velocity; thermoplastic resin films; Bonding; Copper; Drilling; Electrodes; Etching; Large scale integration; Pressing; Resins; Timing; Wiring;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Materials and Packaging, 2005. EMAP 2005. International Symposium on
Print_ISBN :
1-4244-0107-0
Type :
conf
DOI :
10.1109/EMAP.2005.1598258
Filename :
1598258
Link To Document :
بازگشت