DocumentCode
3309266
Title
Development of the embedded LSI technology in PALAP™
Author
Kamiya, H. ; Miyake, T. ; Kobayashi, H. ; Kondo, K.
Author_Institution
DENSO Corp., Aichi, Japan
fYear
2005
fDate
11-14 Dec. 2005
Firstpage
183
Lastpage
186
Abstract
We are developing the embedded LSI technology in PALAP™; PWB developed by DENSO CORP.; made from plural patterned thermoplastic resin films and fabricated with one time hot press process. To understand the behavior of the resin, via, copper land, LSI and so on during press process, a new strong coupling analysis system was developed. Using this system, we analyzed the velocity of resin around the LSI, when embedding the LSI. As a result, it was cleared that the resin under the LSI flowed toward the clearance, and the velocity sharply increased at peripheral position of the LSI. Practically, via under the LSI radially moved from the LSI central part according to the velocity distribution. It is not concerned with the positional relationship between the LSI bump and via that the clearance is different from each other at the left right of the LSI, because the LSI moves with the resin at the same timing and velocity.
Keywords
integrated circuit interconnections; large scale integration; resins; PALAP technology; coupling analysis system; embedded LSI technology; hot press process; resin velocity; thermoplastic resin films; Bonding; Copper; Drilling; Electrodes; Etching; Large scale integration; Pressing; Resins; Timing; Wiring;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronics Materials and Packaging, 2005. EMAP 2005. International Symposium on
Print_ISBN
1-4244-0107-0
Type
conf
DOI
10.1109/EMAP.2005.1598258
Filename
1598258
Link To Document