Title :
Cobalt-manganese oxide thin films thermistors obtained by MOD
Author :
Dragoi, Viorel ; Alexe, M.
Author_Institution :
Nat. Inst. of Mater. Phys., Bucharest, Romania
Abstract :
Co1.4Mn1.6O4 (CMO) thin films were deposited onto silicon by Metalorganic Decomposition (MOD) method. Structure, composition and morphology were investigated by Electron Dispersive X-Ray Spectroscopy (EDX) and X-Ray Diffraction (XRD) and Scanning Electron Microscopy (SEM). Electrical measurements showed possible applications as negative temperature coefficient (NTC) thermistors
Keywords :
X-ray chemical analysis; X-ray diffraction; cobalt compounds; liquid phase deposited coatings; manganese compounds; scanning electron microscopy; semiconductor growth; semiconductor materials; semiconductor thin films; thermistors; Co1.4Mn1.6O4; NTC thermistor; X-ray diffraction; cobalt-manganese oxide thin film; composition; electron dispersive X-ray spectroscopy; metalorganic decomposition; morphology; scanning electron microscopy; silicon substrate; structure; Dispersion; Morphology; Scanning electron microscopy; Semiconductor thin films; Silicon; Spectroscopy; Sputtering; Thermistors; Transistors; X-ray diffraction;
Conference_Titel :
Semiconductor Conference, 1998. CAS '98 Proceedings. 1998 International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-4432-4
DOI :
10.1109/SMICND.1998.732382
