• DocumentCode
    331031
  • Title

    An accurate method of 6H-SiC PIN structures parameter extraction using C-V characteristics

  • Author

    Tudor, B. ; Brezeanu, G. ; Badila, M. ; Locatelli, M.L. ; Chante, J.P. ; Millan, J. ; Godignon, Ph. ; Lebedev, A. ; Savkina, N.S.

  • Author_Institution
    Univ. Polytech. Bucharest, Romania
  • Volume
    1
  • fYear
    1998
  • fDate
    6-10 Oct 1998
  • Firstpage
    315
  • Abstract
    Our paper reports an optimal parameter extraction method based on a new model for the high frequency capacitance-voltage characteristics of the 6H-SiC boron doped junction. The C-V model confirms the presence of two type regions (p- and n-) in the quasi-intrinsic layer induced by boron doping. The extracted values of the net doping of these zones (6-10×1012 cm-3) are in good agreement with previously reported data. In contrast, the thickness of the quasi-intrinsic layer, about twice the epilayer´s width, proves the expansion of the quasi-intrinsic region in the substrate
  • Keywords
    capacitance; p-n junctions; silicon compounds; wide band gap semiconductors; 6H-SiC p-i-n junction; SiC:B; boron doping; epilayer; high frequency capacitance-voltage characteristics; model; parameter extraction; quasi-intrinsic layer; Capacitance; Capacitance-voltage characteristics; Dielectric measurements; Doping; Impurities; Neodymium; Parameter extraction; Quasi-doping; Semiconductor process modeling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference, 1998. CAS '98 Proceedings. 1998 International
  • Conference_Location
    Sinaia
  • Print_ISBN
    0-7803-4432-4
  • Type

    conf

  • DOI
    10.1109/SMICND.1998.732388
  • Filename
    732388