DocumentCode
3312676
Title
Discrete and Half Bridge Module using GaN HFETs for High Temperature Applications more than 200°C
Author
Nomura, Takehiko ; Masuda, Mitsuru ; Yoshida, Seikoh ; Yamate, Tsutomu ; Sudo, Yukio ; Takeda, Jiro
Author_Institution
Furukawa Electr. Co., Ltd., Furukawa
fYear
2007
fDate
27-31 May 2007
Firstpage
117
Lastpage
120
Abstract
AlGaN/GaN HFETs are expected to be a good candidates for power switching application at high temperatures. We optimized the fabrication process of the AlGaN/GaN HFET. A low specific on-state resistance of 6.3 mOmegacm2 and a large breakdown voltage of 600 V were achieved at 225degC. We also designed and fabricated a half bridge module using the AlGaN/GaN HFETs and SiC SBDs. Switching characteristics of the AlGaN/GaN HFET were investigated. The small turn-on delay of 7.2 nsec, which is 1/10 of Si MOSFET, was observed. The switching characteristics of the HFET showed no significant degradation up to 225degC.
Keywords
aluminium compounds; gallium compounds; power HEMT; wide band gap semiconductors; AlGaN-GaN; HFET; half bridge module; high electron mobility transistors; high temperature applications; power switching applications; switching characteristics; temperature 225 C; turn-on delay; voltage 600 V; Aluminum gallium nitride; Bridge circuits; Delay; Fabrication; Gallium nitride; HEMTs; MODFETs; MOSFET circuits; Silicon carbide; Temperature; GaN; HFET; high temperature; switching;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and IC's, 2007. ISPSD '07. 19th International Symposium on
Conference_Location
Jeju Island
Print_ISBN
1-4244-1095-9
Electronic_ISBN
1-4244-1096-7
Type
conf
DOI
10.1109/ISPSD.2007.4294946
Filename
4294946
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