• DocumentCode
    3312676
  • Title

    Discrete and Half Bridge Module using GaN HFETs for High Temperature Applications more than 200°C

  • Author

    Nomura, Takehiko ; Masuda, Mitsuru ; Yoshida, Seikoh ; Yamate, Tsutomu ; Sudo, Yukio ; Takeda, Jiro

  • Author_Institution
    Furukawa Electr. Co., Ltd., Furukawa
  • fYear
    2007
  • fDate
    27-31 May 2007
  • Firstpage
    117
  • Lastpage
    120
  • Abstract
    AlGaN/GaN HFETs are expected to be a good candidates for power switching application at high temperatures. We optimized the fabrication process of the AlGaN/GaN HFET. A low specific on-state resistance of 6.3 mOmegacm2 and a large breakdown voltage of 600 V were achieved at 225degC. We also designed and fabricated a half bridge module using the AlGaN/GaN HFETs and SiC SBDs. Switching characteristics of the AlGaN/GaN HFET were investigated. The small turn-on delay of 7.2 nsec, which is 1/10 of Si MOSFET, was observed. The switching characteristics of the HFET showed no significant degradation up to 225degC.
  • Keywords
    aluminium compounds; gallium compounds; power HEMT; wide band gap semiconductors; AlGaN-GaN; HFET; half bridge module; high electron mobility transistors; high temperature applications; power switching applications; switching characteristics; temperature 225 C; turn-on delay; voltage 600 V; Aluminum gallium nitride; Bridge circuits; Delay; Fabrication; Gallium nitride; HEMTs; MODFETs; MOSFET circuits; Silicon carbide; Temperature; GaN; HFET; high temperature; switching;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and IC's, 2007. ISPSD '07. 19th International Symposium on
  • Conference_Location
    Jeju Island
  • Print_ISBN
    1-4244-1095-9
  • Electronic_ISBN
    1-4244-1096-7
  • Type

    conf

  • DOI
    10.1109/ISPSD.2007.4294946
  • Filename
    4294946