Title :
The Influence of NBL Layout and LOCOS Space on Component ESD and System Level ESD for HV-LDMOS
Author :
Lee, Jian Hsing ; Chen, S.H. ; Tsai, Y.T. ; Lee, D.B. ; Chen, F.H. ; Liu, W.C. ; Chung, C.M. ; Hsu, S.L. ; Shih, J.R. ; Liang, Alan Y. ; Wu, Kenneth
Author_Institution :
Taiwan Semicond. Manuf. Co., Hsin-Chu
Abstract :
This paper investigates the influence of the N-type buried layer (NBL) layout and LOCOS space on the ESD performance and trigger voltage of the lateral DMOS (LDMOS) device. Without adequate LOCOS spacing, LDMOS is vulnerable to ESD damage. If the LOCOS space is sufficiently wide, adding NBL structure can further improve LDMOS ESD performance significantly. This is because NBL can switch the current passage from the surface channel region to the bulk NBL during an ESD zapping, thus, avoiding localized highly damaging ESD current flow in the channel region.
Keywords :
electrostatic discharge; integrated circuit layout; semiconductor device breakdown; semiconductor device reliability; semiconductor device testing; HV-LDMOS; LOCOS space; N-type buried layer layout; component ESD; lateral DMOS device; surface channel region; system level ESD; trigger voltage; Application specific integrated circuits; Displays; Driver circuits; Electrostatic discharge; Failure analysis; IEC standards; Space technology; Switches; System testing; Voltage;
Conference_Titel :
Power Semiconductor Devices and IC's, 2007. ISPSD '07. 19th International Symposium on
Conference_Location :
Jeju Island
Print_ISBN :
1-4244-1095-9
Electronic_ISBN :
1-4244-1096-7
DOI :
10.1109/ISPSD.2007.4294960