DocumentCode
3313328
Title
RESURFed Quasi Lateral IGBT Structure for High Current PICs
Author
Narayanan, E. M Sankara ; Ramakrishna, Tadikonda ; Green, David W.
Author_Institution
De Montfort Univ., Leicester
fYear
2007
fDate
27-31 May 2007
Firstpage
245
Lastpage
248
Abstract
In this paper a new power device architecture is proposed. The concept is shown to significantly enhance the current carrying capability of devices suitable for integration in power integrated circuits (PICs). The concept combines the advantages of the RESURF principle under blocking conditions to yield a compact device and uses multiple MOSFET cathode cells, formed on the backside of the wafer to yield a high level of vertical current modulation in the on-state. The new architecture is shown to significantly enhance the forward bias safe operating area and also the forward voltage drop by more than 50%. Critically, it is also shown that the additional backside cathode cells have a minimal effect on the turn-off losses in comparison to a conventional lateral IGBT.
Keywords
MOSFET; insulated gate bipolar transistors; power integrated circuits; MOSFET cathode cells; RESURF principle; power device architecture; power integrated circuits; quasi lateral IGBT structure; Cathodes; Costs; Current density; Doping; Insulated gate bipolar transistors; Integrated circuit yield; Isolation technology; Power semiconductor devices; Silicon on insulator technology; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and IC's, 2007. ISPSD '07. 19th International Symposium on
Conference_Location
Jeju Island
Print_ISBN
1-4244-1095-9
Electronic_ISBN
1-4244-1096-7
Type
conf
DOI
10.1109/ISPSD.2007.4294978
Filename
4294978
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