DocumentCode
3313372
Title
Normally-off AlGaN/GaN Low-Density-Drain HEMTs (LDD-HEMT) with Enhanced Breakdown Voltage and Suppressed Current Collapse
Author
Song, Di ; Liu, Jie ; Cheng, Zhiqun ; Tang, Wilson C W ; Lau, Kei May ; Chen, Kevin J.
Author_Institution
Hong Kong Univ. of Sci. & Technol., Hong Kong
fYear
2007
fDate
27-31 May 2007
Firstpage
257
Lastpage
260
Abstract
We report a low-density drain HEMT (LDD-HEMT) that exhibits enhanced breakdown voltage and reduced current collapse. The LDD region is created by introducing negatively charged fluorine ions in the region between the gate and drain electrodes, effectively modifying the surface field distribution on the drain side of the HEMT without using field plate electrodes. Without changing the device physical dimensions, the breakdown voltage can be improved by 50% in LDD-HEMT and the current collapse can be reduced. No degradation of current cutoff frequency (ft) and slight improvement in power gain cutoff frequency (fmax) are achieved in the LDD-HEMT, owing to the absence of any additional field plate electrode.
Keywords
III-V semiconductors; aluminium compounds; electric breakdown; gallium arsenide; high electron mobility transistors; AlGaN-GaN; AlGaN-GaN - Interface; LDD-HEMT; charged fluorine ions; current cutoff frequency; drain electrodes; enhanced breakdown voltage; low-density-drain HEMT; reduced current collapse; suppressed current collapse; surface field distribution; Aluminum gallium nitride; Cutoff frequency; Electrodes; Gallium nitride; HEMTs; MODFETs; Plasma applications; Plasma devices; Plasma measurements; Plasma sources;
fLanguage
English
Publisher
ieee
Conference_Titel
Power Semiconductor Devices and IC's, 2007. ISPSD '07. 19th International Symposium on
Conference_Location
Jeju Island
Print_ISBN
1-4244-1095-9
Electronic_ISBN
1-4244-1096-7
Type
conf
DOI
10.1109/ISPSD.2007.4294981
Filename
4294981
Link To Document