Title :
Yield enhancement with particle defects reduction
Author :
Mori, Kiyoshi ; Nguyen, Nam ; Keeton, Dewey ; Burns, Ross
Author_Institution :
Sony Microelectron., San Antonio, TX, USA
Abstract :
Contamination control is a major issue in VLSI fabrication. Particle control, in particular, is crucial to the success and profitability of the manufacturing process. While most production lines have a particle monitoring system, the direct correlation between defect level and device yield is not always obvious, and therefore prioritizing quick yield improvement efforts can be difficult. This paper discusses a solution with the total particle control system which has provided a practical method for yield enhancement
Keywords :
surface contamination; VLSI fabrication; contamination control; defect level; manufacturing process; particle defects reduction; particle monitoring system; production lines; total particle control system; yield enhancement; Cleaning; Contamination; Control systems; Fabrication; Manufacturing processes; Monitoring; Particle production; Random access memory; Testing; Very large scale integration;
Conference_Titel :
Defect and Fault Tolerance in VLSI Systems, 1994. Proceedings., The IEEE International Workshop on
Conference_Location :
Montreal, Que.
Print_ISBN :
0-8186-6307-3
DOI :
10.1109/DFTVS.1994.630036
