DocumentCode :
3317221
Title :
Evidence and modeling of anomalous low concentration arsenic inactivation
Author :
Borucki, L.J.
Author_Institution :
Motorola Corp., Mesa, AZ, USA
fYear :
1990
fDate :
9-12 Dec. 1990
Firstpage :
753
Lastpage :
756
Abstract :
Experimental results are discussed that indicate that implanted arsenic is sometimes transported by large populations of a mobile species that is neutral at room temperature, causing inactivation throughout the profile and unexpectedly high sheet resistances. This transport path occurs in strictly low concentration diffusion and in the early stages of high concentration diffusion, prior to precipitation. Novel models are presented that fit low concentration chemical profiles, anomalous electrical data, and early high concentration data. One of the models successfully predicts sheet resistances in high concentration profiles that have not yet shown evidence of precipitation, suggesting that interstitial arsenic is the precursor to normal high concentration inactivation.<>
Keywords :
arsenic; diffusion in solids; doping profiles; elemental semiconductors; semiconductor doping; Si:As; elemental semiconductors; high concentration diffusion; inactivation; low concentration chemical profiles; mobile species; sheet resistances; transport path; Chemicals; Predictive models; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1990. IEDM '90. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1990.237091
Filename :
237091
Link To Document :
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