Effects of stress concentration on metal voiding during dielectric deposition

Author

Naeem, Munir D. ; Flaitz, Philip L. ; Chidambarrao, Dureseti

Author_Institution

Microelectron. Div., IBM Corp., Hopewell Junction, NY, USA

fYear

1999

fDate

1999

Firstpage

270

Lastpage

275

Abstract

The reliability of back end of line (BEOL) metallization for interconnection of semiconductor devices is extremely important. It is necessary that the metal lines be void free to meet electromigration requirements for advanced semiconductor devices. The reactive ion etching (RIE) of Al-Cu (0.5%) metallization is suspected to cause metal voids. Our systematic study of metal voids reveals the role of stress and stress concentration in void formation during dielectric material deposition after interconnect patterning by RIE. The stress simulation confirms the stress concentration at certain points on metal lines that lead to void formation. The role of side-wall (SW) angles of metal lines formed by RIE in stress concentration has been investigated. The effect of different dielectric materials such as spin on glass (SOG) and chemical vapor deposited (CVD) tetraethyl oxysilane (TEOS) on void formation has also been studied

Keywords

aluminium alloys; copper alloys; dielectric thin films; electromigration; failure analysis; integrated circuit interconnections; integrated circuit metallisation; integrated circuit reliability; internal stresses; sputter etching; stress analysis; voids (solid); Al-Cu metallization; AlCu; AlCu-SiO₂; CVD TEOS dielectrics; CVD tetraethyl oxysilane dielectrics; RIE; back end of line metallization; dielectric deposition; dielectric material deposition; dielectric materials; electromigration; interconnect patterning; interconnection; metal line side-wall angles; metal lines; metal voiding; metal voids; reactive ion etching; reliability; semiconductor devices; spin on glass dielectrics; stress concentration; stress concentration effects; stress simulation; void formation; Chemical vapor deposition; Dielectric materials; Electromigration; Etching; Glass; Lead; Metallization; Semiconductor device reliability; Semiconductor devices; Stress;

fLanguage

English

Publisher

ieee

Conference_Titel

Electronics Manufacturing Technology Symposium, 1999. Twenty-Fourth IEEE/CPMT

Conference_Location

Austin, TX

ISSN

1089-8190

Print_ISBN

0-7803-5502-4

Type

conf

DOI

10.1109/IEMT.1999.804832

Filename

804832