DocumentCode :
3318086
Title :
A unified mobility model for device simulation
Author :
Klaassen, D.B.M.
Author_Institution :
Philips Res. Lab., Eindhoven, Netherlands
fYear :
1990
fDate :
9-12 Dec. 1990
Firstpage :
357
Lastpage :
360
Abstract :
A physics-based analytical model is presented that unifies the descriptions of majority and minority carrier mobility and that includes screening of the impurities by charge carriers, electron-hole scattering, clustering of impurities, and the full temperature dependence of both majority and minority carrier mobility. The electron and hole mobilities are given as analytical functions of local variables: ionized donor, ionized acceptor, electron and hole concentrations, and the temperature. The excellent agreement between the proposed model and published experimental data on the carrier mobility in silicon reinforces the model predictions on less investigated aspects of the mobility, e.g. the temperature dependence of the minority carrier mobility, which is distinctly different from that of the majority carrier mobility.<>
Keywords :
carrier density; carrier mobility; impurities; minority carriers; semiconductor device models; Si; charge carriers; clustering; device simulation; electron concentration; electron mobility; electron-hole scattering; hole concentrations; hole mobilities; impurities; ionized acceptor; ionized donor; majority carrier mobility; minority carrier mobility; physics-based analytical model; temperature dependence; unified mobility model; Analytical models; Charge carrier processes; Charge carriers; Electron mobility; Impurities; Predictive models; Scattering; Silicon; Temperature dependence;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1990. IEDM '90. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1990.237157
Filename :
237157
Link To Document :
بازگشت