Title :
Submicron spaced lens array process technology for a high photosensitivity CCD image sensor
Author :
Sano, Y. ; Nomura, T. ; Aoki, H. ; Terakawa, S. ; Kodama, Hiroyoshi ; Aoki, T. ; Hiroshima, Y.
Author_Institution :
Matsushita Electron. Corp., Kyoto, Japan
Abstract :
Submicron-spaced lens array process technology has been developed for an IT-CCD (interline transfer charge coupled device) image sensor to realize high photosensitivity. The photosensitivity of a 0.8- mu m-spaced lens array has been increased to more than 2.5 times the sensitivity for the case of no lens, and an effective aperture ratio of 68% has been realized in a 1/3-inch optical format 512 (H)*492 (V) pixel IT-CCD image sensor. By means of a lens simulation, it was found that the rectangular dome-lens shows the highest sensitivity among lenses of various forms for a 1/3-inch IT-CCD image sensor. Experimental results for the rectangular dome-lenses are well explained by this simulation. The submicron-spaced lens array process has been established by adopting a new type of lens resin, an optimized lens design, and an excellent planarization process on the color filter layer.<>
Keywords :
CCD image sensors; integrated optics; lenses; 0.333 in; 0.8 micron; CCD image sensor; IT-CCD; aperture ratio; color filter layer; high photosensitivity; interline transfer charge coupled device; lens resin; lens simulation; microlens arrays; optimized lens design; planarization process; rectangular dome-lens; sensitivity; submicron-spaced lens array process; Apertures; Charge-coupled image sensors; Image sensors; Lenses; Optical arrays; Optical filters; Optical sensors; Pixel; Sensor arrays; Space technology;
Conference_Titel :
Electron Devices Meeting, 1990. IEDM '90. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
DOI :
10.1109/IEDM.1990.237174
