DocumentCode :
331841
Title :
Techniques for monolithic integration of silica-based waveguide devices with optoelectronics
Author :
Bazylenko, Michael ; Gross, Mark ; Gauja, Eric ; Chu, Pak Lim
Author_Institution :
Sch. of Electr. Eng., New South Wales Univ., Sydney, NSW, Australia
Volume :
1
fYear :
1998
fDate :
1-4 Dec 1998
Firstpage :
38
Abstract :
A technique for monolithic integration of silica-based waveguides and optoelectronic components has been developed. The low temperature fabrication budget necessary to preserve the optoelectronic devices is obtained through the use the hollow cathode plasma enhanced CVD technique
Keywords :
integrated optoelectronics; optical communication equipment; optical fabrication; optical planar waveguides; plasma CVD; silicon compounds; wavelength division multiplexing; SiO2; hollow cathode plasma enhanced CVD technique; low temperature fabrication budget; monolithic integration; optoelectronic components; optoelectronic devices; optoelectronics; silica-based WDM planar waveguide devices; silica-based waveguides; Absorption; Annealing; Chemical vapor deposition; Electrodes; Monolithic integrated circuits; Nitrogen; Optical fiber devices; Plasma temperature; Silicon compounds; WDM networks;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1998. LEOS '98. IEEE
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-4947-4
Type :
conf
DOI :
10.1109/LEOS.1998.737721
Filename :
737721
Link To Document :
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