DocumentCode :
3318506
Title :
Design of quasi-vertical GaN high power Schottky diodes based on field plate termination
Author :
Sundaramoorthy, Vinoth ; Nistor, Iulian
Author_Institution :
Corp. Res., ABB Switzerland Ltd., Baden-Dättwil, Switzerland
Volume :
02
fYear :
2010
fDate :
11-13 Oct. 2010
Firstpage :
401
Lastpage :
404
Abstract :
In this paper, the numerical design of a optimized quasi-vertical gallium nitride power Schottky diode for high power electronic applications is illustrated. Bevel oxide field plate was employed as a junction termination technique to enhance the breakdown voltage in reverse bias. It was found that a maximum breakdown voltage of 1995 V was obtained for a bevel width of 18 um and oxide thickness of 1.5 um. This diode with on-state resistance of 14mΩcm2 has a high power figure of merit of 274 MW/cm2.
Keywords :
III-V semiconductors; Schottky diodes; gallium compounds; numerical analysis; power semiconductor diodes; semiconductor device breakdown; wide band gap semiconductors; GaN; bevel oxide field plate; field plate termination; high-power Schottky diodes; junction termination; numerical design; on-state resistance; power electronic applications; quasivertical diode; reverse bias breakdown voltage; size 1.5 mum; size 18 mum; Electric breakdown; Electric fields; Gallium nitride; Materials; Schottky diodes; Silicon carbide; Field plate; bevel oxide; breakdown voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference (CAS), 2010 International
Conference_Location :
Sinaia
ISSN :
1545-827X
Print_ISBN :
978-1-4244-5783-0
Type :
conf
DOI :
10.1109/SMICND.2010.5650593
Filename :
5650593
Link To Document :
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