DocumentCode :
3318802
Title :
Strained layer quantum well heterostructure lasers
Author :
Coleman, J.J.
Author_Institution :
Compound Semicond. Microelectron. Lab., Illinois Univ., Urbana, IL, USA
fYear :
1990
fDate :
9-12 Dec. 1990
Firstpage :
125
Lastpage :
128
Abstract :
The metallurgical aspects of critical thickness in strained layer heterostructure systems, the effects of strain and quantum size effect on emission wavelength, and optical gain and threshold current density considerations associated with strained layer lasers are examined. The characteristics of broad area lasers under conditions of varying quantum well composition, thickness with respect to the critical thickness, growth conditions, stripe width, and other structural parameters are considered. More complicated InGaAs-GaAs strained layer quantum well heterostructure lasers, such as index guided laser structures, are also described. In contrast to GaAs quantum well heterostructure lasers, an antiguide is formed by strong free carrier effects in narrow oxide stripe InGaAs-GaAs strained layer lasers. This effect can be utilized in, laser arrays.<>
Keywords :
III-V semiconductors; current density; gallium arsenide; indium compounds; semiconductor junction lasers; size effect; InGaAs-GaAs; antiguide; broad area lasers; critical thickness; emission wavelength; free carrier effects; growth conditions; heterostructure lasers; index guided laser structures; narrow oxide stripe; optical gain; quantum size effect; quantum well; semiconductor lasers; strained layer; stripe width; threshold current density; Capacitive sensors; Gallium arsenide; Optical arrays; Quantum well lasers; Stimulated emission; Structural engineering; Threshold current;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1990. IEDM '90. Technical Digest., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Type :
conf
DOI :
10.1109/IEDM.1990.237211
Filename :
237211
Link To Document :
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