DocumentCode
3318882
Title
Lithography mask made by silver nanorods
Author
Chen, Sheng-Chung ; Wei, Yung-Chiang ; Pan, Heng-Yau ; Chiu, Kuo-Pin ; Shiu, Jr-Chau ; Kuo, Meng-Wei ; Chen, Chi-Ming
Author_Institution
Dept. of Optoelectron. Eng., Far East Univ., Tainan, Taiwan
Volume
2
fYear
2010
fDate
5-7 May 2010
Firstpage
503
Lastpage
506
Abstract
Lithography is a key process in fabrication of semiconductors, especially, it plays the main role in the size of integrated circuit. Because of the diffraction limit, the size of lithography image cannot be shrunk less than wavelength. In this paper, we offer a practical method to get a subwavelength image by using visible light. This method is based on the localized surface plasmon among silver nanorods, if the conditions of the polarization of light and configuration of the nanorod mask are optimized.
Keywords
lithography; masks; nanorods; surface plasmons; integrated circuit; lithography mask; localized surface plasmon; semiconductor fabrication; silver nanorods; subwavelength image; visible light; Electrons; Light sources; Lithography; Nanostructures; Optical arrays; Optical coupling; Optical surface waves; Plasmons; Resonance; Silver; Lithography; subwavelength image;
fLanguage
English
Publisher
ieee
Conference_Titel
Computer Communication Control and Automation (3CA), 2010 International Symposium on
Conference_Location
Tainan
Print_ISBN
978-1-4244-5565-2
Type
conf
DOI
10.1109/3CA.2010.5533391
Filename
5533391
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