DocumentCode
3319573
Title
CMOS cantilever microstructures as thin film deposition monitors
Author
Spacek, Martin ; Brown, Keith B. ; Ma, Yuan ; Robinson, Alexander M. ; Lawson, Ron P W ; Allegretto, Walter
Author_Institution
Dept. of Electr. & Comput. Eng., Alberta Univ., Edmonton, Alta., Canada
Volume
3
fYear
1999
fDate
9-12 May 1999
Firstpage
1648
Abstract
Increasing the mass of an oscillating microcantilever causes a decrease in its vibrational resonant frequency. We have deposited MgF/sub 2/ on our CMOS designed cantilever-in-cantilever microdevices and observed the resonant frequency decrease linearly with layer thickness. With initial results showing a sensitivity on the order of Angstroms, such devices demonstrate potential for novel application as thin film monitors.
Keywords
CMOS integrated circuits; microsensors; thickness measurement; thin films; CMOS microstructure; MgF/sub 2/; cantilever-in-cantilever microdevice; thickness measurement; thin film deposition monitor; vibrational resonant frequency; Aluminum; Crystalline materials; Electrical resistance measurement; Microstructure; Monitoring; Optical films; Optical materials; Resonant frequency; Semiconductor thin films; Sputtering;
fLanguage
English
Publisher
ieee
Conference_Titel
Electrical and Computer Engineering, 1999 IEEE Canadian Conference on
Conference_Location
Edmonton, Alberta, Canada
ISSN
0840-7789
Print_ISBN
0-7803-5579-2
Type
conf
DOI
10.1109/CCECE.1999.804964
Filename
804964
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