DocumentCode :
331988
Title :
Visible-blind GaN PIN photodiodes
Author :
Smith, G.M. ; Boutros, K.S. ; Phanse, V.M. ; Chriss, M.F. ; Tamweber, F.D.
Author_Institution :
Epitronics/ATMI, Danbury, CT, USA
Volume :
1
fYear :
1998
fDate :
1-4 Dec 1998
Firstpage :
366
Abstract :
The uniqueness of the nitrides for detectors lies in their wide bandgaps that can be tailored by varying the composition of the quaternary alloy AlInGaN. We report on the performance of GaN PIN photodiodes grown by MOVPE with various intrinsic region thicknesses
Keywords :
III-V semiconductors; MOCVD; gallium compounds; optical fabrication; p-i-n photodiodes; photodetectors; vapour phase epitaxial growth; AlInGaN; GaN; GaN PIN photodiodes; MOVPE growth; intrinsic region thicknesses; nitride detectors; quaternary alloy AlInGaN; visible-blind GaN PIN photodiodes; wide bandgaps; Dark current; Epitaxial growth; Epitaxial layers; Etching; Gallium nitride; Infrared detectors; Infrared sensors; PIN photodiodes; Photonic band gap; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1998. LEOS '98. IEEE
Conference_Location :
Orlando, FL
Print_ISBN :
0-7803-4947-4
Type :
conf
DOI :
10.1109/LEOS.1998.737882
Filename :
737882
Link To Document :
بازگشت