DocumentCode
3320003
Title
Fine pitch copper wire bonding on copper bond pad process optimization
Author
Lam, Kan Wai ; Ho, Hong Meng ; Stoukatch, Serguei ; Van De Peer, Myrian ; Ratchev, Petar ; Vath, Charles J., III ; Schervan, Augustin ; Beyne, Eric
Author_Institution
IMEC, Leuven, Belgium
fYear
2002
fDate
4-6 Dec. 2002
Firstpage
63
Lastpage
68
Abstract
The development of a new copper wire bonding process for fine pitch applications is currently in progress. The bond pad cleanliness and oxidation levels are important for the ball bond (first bond). By applying an organic coating layer it is possible to protect the copper bond pad from oxidation. Copper wire in an unopened sealed spool already has a thin layer of copper oxide on the surface and does not readily weld (stitch bond) to silver spot plated lead frames and BGA substrates with Au metallization. The intent of this study is to establish the effects of the process parameters for a wire bond process with copper wire with an initial bond pad of 70 μm. The copper ball bond on copper bond pad and copper wire stitch bond on silver spot plated lead frame and BGA substrate as well the materials were studied.
Keywords
ball grid arrays; copper; corrosion protective coatings; fine-pitch technology; integrated circuit bonding; integrated circuit metallisation; optimisation; oxidation; 70 micron; Au metallization; BGA substrates; Cu-Ag; Cu-Au; bond pad cleanliness; bonding process optimization; copper bond pad; fine pitch copper wire bonding; first ball bond; organic coating layer; pad oxidation level; protective coating; silver spot plated lead frames; stitch bond; surface copper oxide; welding; Bonding processes; Coatings; Copper; Gold; Lead compounds; Oxidation; Protection; Silver; Spot welding; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Materials and Packaging, 2002. Proceedings of the 4th International Symposium on
Print_ISBN
0-7803-7682-X
Type
conf
DOI
10.1109/EMAP.2002.1188814
Filename
1188814
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