• DocumentCode
    3320259
  • Title

    Ab initio calculations of 3C-SiC(111)/Ti polar interfaces

  • Author

    Tanaka, S. ; Kohyama, M.

  • Author_Institution
    Dept. of Mater. Phys., Osaka Nat. Res. Inst., Japan
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    299
  • Lastpage
    302
  • Abstract
    Ab initio pseudopotential calculations of the 3C-SiC(111)/Ti polar interface have been performed. The C-Ti bond at the C-terminated interface has strong p-d covalent interactions between C-2p and Ti-3d orbitals while the Si-Ti bond at the Si-terminated interface has metallic behaviour. Adhesive energy values for the Si- and the C-terminated interface are 4.673 and 5.213 Jm-2. The calculated value of the p-type Schottky-barrier height are different for each interface due to the difference of atomic and electronic structure between the interfaces
  • Keywords
    Schottky barriers; ab initio calculations; density functional theory; electronic density of states; interface structure; pseudopotential methods; silicon compounds; titanium; wide band gap semiconductors; 3C-SiC(111)/Ti polar interfaces; C-2p orbital; C-Ti bond; C-terminated interface; Si-Ti bond; Si-terminated interface; SiC-Ti; Ti-3d orbital; ab initio pseudopotential calculations; adhesive energy; metallic behaviour; p-d covalent interactions; p-type Schottky-barrier height; Adhesives; Atomic layer deposition; Bonding; Ceramics; Electrons; Orbital calculations; Physics; Silicon carbide; Slabs; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconducting and Insulating Materials Conference, 2000. SIMC-XI. International
  • Conference_Location
    Canberra, ACT
  • Print_ISBN
    0-7803-5814-7
  • Type

    conf

  • DOI
    10.1109/SIM.2000.939247
  • Filename
    939247