Title :
A Generalized Dill Exposure Model for Negative Thick Photoresist
Author :
Liu, Ren ; Zheng, Jin Jin ; Zhou, H.J. ; Tian, Y.C. ; Liu, G. ; Shen, L.G.
Author_Institution :
Univ. of Sci. & Technol. of China, Hefei
Abstract :
In this paper, Dill´s classical exposure model for positive photoresist is generalized to fit negative photoresist. Based on Dill´s model, the differences between positive and negative photoresist is analyzed and then the equations of chemical kinetics inside the SU-8 negative photoresist are established. To consider the scattering and refraction of light in thick photoresist, angular spectrum theory is used to calculate the diffractive field inside thick photoresist. A new exposure model is established for negative thick photoresist.
Keywords :
light refraction; light scattering; photoresists; reaction kinetics; Dill classical exposure model; SU-8 negative photoresist; angular spectrum theory; chemical kinetics; generalized Dill exposure model; light refraction; light scattering; negative thick photoresist; positive photoresist; Chemical analysis; Equations; Lighting; Lithography; Optical distortion; Optical refraction; Optical scattering; Photochemistry; Proximity effect; Resists; Exposure model; Lithography simulation; SU-8 photoresist; UV-LIGA;
Conference_Titel :
Information Acquisition, 2007. ICIA '07. International Conference on
Conference_Location :
Seogwipo-si
Print_ISBN :
1-4244-1220-X
Electronic_ISBN :
1-4244-1220-X
DOI :
10.1109/ICIA.2007.4295744
