Title :
Pattern Transfer Error Correction of Certain Layer in SU-8 Deep UV Lithography
Author :
Chen, Y.M. ; Zheng, J.J. ; Zhou, H.J. ; Zhang, Z.J. ; Tian, Y.C. ; Liu, G. ; Li, X.G. ; Shen, L.G.
Author_Institution :
USTC, Hefei
Abstract :
In contact lithography it is hard to fabricate microstructures with high precision and high aspect ratio due to diffraction. In this paper, patter transfer error of certain deep layer in SU-8 deep UV lithography will be corrected based on the model-area based correction method .The algorithm reduces the complexity and improves the efficiency of correction.
Keywords :
error correction; micromechanical devices; photoresists; ultraviolet lithography; SU-8 deep UV lithography; aspect ratio; contact lithography; deep layer; fabricate microstructures; model-area based correction method; pattern transfer error correction; Computational modeling; Computer simulation; Diffraction; Error correction; Eyes; Lenses; Lighting; Lithography; Microstructure; Resists; SU-8 photoresist; UV-LIGA; error correction; lithography simulation; pattern transfer;
Conference_Titel :
Information Acquisition, 2007. ICIA '07. International Conference on
Conference_Location :
Seogwipo-si
Print_ISBN :
1-4244-1220-X
Electronic_ISBN :
1-4244-1220-X
DOI :
10.1109/ICIA.2007.4295753
