Title :
EQ integrated pprocess trending with tfm monitoring for backend equipments
Author :
Rathgeber, Thomas ; Haueis, Norbert
Author_Institution :
Productivity & Oper. Excellence Group, Infineon Technol. AG
Abstract :
This paper addresses a new approach of equipment integrated process control with automated corrective action and online monitoring of processes with TFM (total fab monitoring), The TFM trending module combines the advantages of a standardized reporting tool with the flexibility of equipment-specific data acquisition. The tool enables detailed analyses of process parameters. It supports continuous fab monitoring purposes as well as process engineering analyses during ramp-up or process improvement projects. With the 2nd approach this paper provides an overview and background of the needs to establish a standardized process reporting system for back-end. It shows examples of integrated process monitoring application using interface A for data acquisition. Several applications have automated process correction action and automated EQ "start/stop" function used as a "closed loop" failure detection and classification system (FDC)
Keywords :
computerised monitoring; data acquisition; integrated circuit manufacture; process control; process monitoring; production engineering computing; EQ integrated process trending; Interface A; TFM monitoring; TFM trending module; automated EQ function; automated corrective action; automated process correction action; backend equipments; closed loop failure classification system; closed loop failure detection system; equipment integrated process control; equipment-specific data acquisition; online monitoring; process engineering analyses; process improvement projects; total fab monitoring; Acoustic signal detection; Automatic control; Computerized monitoring; Condition monitoring; Costs; Data acquisition; Process control; Product development; Production; Productivity;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference and Workshop, 2005 IEEE/SEMI
Conference_Location :
Munich
Print_ISBN :
0-7803-8997-2
DOI :
10.1109/ASMC.2005.1438782