• DocumentCode
    3322008
  • Title

    Low-yield flier wafer analysis strategies

  • Author

    Dunham, Brian A. ; Kirsch, Travis D. ; Litwin, Stuart ; Covert, Michael ; Bierwag, Alex ; Garcia, Daniel ; Holt, Kendall

  • Author_Institution
    Fab25 Product Eng. Group, Austin, TX
  • fYear
    2005
  • fDate
    11-12 April 2005
  • Firstpage
    149
  • Lastpage
    153
  • Abstract
    This paper discusses several techniques for identifying, classifying, and analyzing low yielding flier wafers. Low yielding wafers in otherwise normal yielding lots can have significant impacts on yield variability and wafer costs. In addition, these unique instances can often mask and convolute larger baseline issues that have more significant impacts on die yield. Control charts using different statistical parameters can help identify these wafers. Once known, they can be classified by failure type, with that data then being stored in a database. These wafers can be analyzed for root cause with a number of techniques, which include in-line metrology correlations, wafer positional analysis, electrical bitmapping and failure analysis. The techniques in this paper are employed by the Product Engineering Department at the Spansion Fab25 facility, which manufactures 200 mm 0.11 micron Flash memory technologies
  • Keywords
    control charts; flash memories; integrated circuit measurement; integrated circuit yield; Product Engineering Department; Spansion Fab25 facility; control charts; die yield; different statistical parameters; electrical bitmapping; failure analysis; flash memory technologies; flier wafer analysis strategies; inline metrology correlations; wafer costs; wafer positional analysis; yield variability; Control charts; Costs; Databases; Failure analysis; Flash memory; Manufacturing processes; Metrology; Pulp manufacturing; Semiconductor device manufacture; Semiconductor device testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 2005 IEEE/SEMI
  • Conference_Location
    Munich
  • Print_ISBN
    0-7803-8997-2
  • Type

    conf

  • DOI
    10.1109/ASMC.2005.1438785
  • Filename
    1438785