• DocumentCode
    3322349
  • Title

    Hybrid manufacturing - lower cost access to DSM technology

  • Author

    Williams, Brett N. ; Nelson, Mark M.

  • Author_Institution
    Technol. Res. & Dev., AMI Semicond., Inc., Pocatello, ID
  • fYear
    2005
  • fDate
    11-12 April 2005
  • Firstpage
    234
  • Lastpage
    238
  • Abstract
    The need for access to deep sub-micron (DSM) technology to supply cost effective designs to customers is offset by the high cost of entry. The hybrid manufacturing approach partially fabricates wafers in one facility and then completes the wafer fabrication in another facility, using compatible but different processes. There are significant cost benefits to using hybrid manufacturing for a deep submicron (DSM) offering. It provides lower non-recoverable expenses (NRE) as well as lower manufacturing costs per-wafer. Flexibility is increased for customers with smaller run rates. There are many technical challenges involved in making this hybrid process manufacturable and robust. These challenges have been solved in the implementation of our XPressArraytrade technology offering
  • Keywords
    cost reduction; industrial economics; integrated circuit manufacture; integrated circuit technology; XPressArraytrade technology; cost effective designs; deep submicron technology; hybrid manufacturing; nonrecoverable expenses; wafer fabrication; Ambient intelligence; Costs; Fabrication; Foundries; Integrated circuit manufacture; Integrated circuit technology; Manufacturing processes; Metallization; Robustness; Semiconductor device manufacture;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Manufacturing Conference and Workshop, 2005 IEEE/SEMI
  • Conference_Location
    Munich
  • Print_ISBN
    0-7803-8997-2
  • Type

    conf

  • DOI
    10.1109/ASMC.2005.1438801
  • Filename
    1438801