Title :
Plasma expansion and current flow in a vacuum arc with a small anode
Author :
Beilis, I.I. ; Keidar, M. ; Boxman, R.L. ; Goldsmith, S.
Author_Institution :
Electr. Discharge & Plasma Lab., Tel Aviv Univ., Israel
Abstract :
A low-density plasma flow in a vacuum arc with a small anode which intercepts only part of the cathodic plasma was studied theoretically using a two-dimensional approximation. The plasma expansion was modeled using the sourceless steady-state hydrodynamic equations, where the free boundary of the plasma was determined by a self-consistent solution of the gas-dynamic and electrical current equations. The influence of the ratio of the anode radius Ra to initial plasma jet radius R o on the plasma density, velocity, current distribution and anode sheath voltage drop is analyzed. The mass and current flow in a 500A A arc with Ra/Ro=1 are compressed near the axis, leading to an increase in the plasma density by a factor of 2 and in the axial current density by a factor of 1.5 at a distance of about the plasma jet radius from the starting plane. In this case, the radial anode sheath drop distribution is approximately uniform and the anode sheath drop has a value of about 0.4 Te where Te is the electron temperature. In the case of a small anode, the anode sheath potential drop becomes nonuniform radially and the centerline anode voltage drop increases to 0.9 Te
Keywords :
anodes; approximation theory; current density; current distribution; plasma density; plasma flow; plasma theory; vacuum arcs; 500 A; anode radius; anode sheath potential drop; anode sheath voltage drop; cathodic plasma; current distribution; current flow; electrical current equation; electron temperature; gas-dynamic equation; low-density plasma flow; mass flow; plasma density; plasma expansion; plasma free boundary; plasma jet radius; plasma velocity; self-consistent solution; small anode; sourceless steady-state hydrodynamic equations; two-dimensional approximation; vacuum arc; Anodes; Equations; Hydrodynamics; Plasma density; Plasma sheaths; Plasma sources; Plasma temperature; Steady-state; Vacuum arcs; Voltage;
Conference_Titel :
Discharges and Electrical Insulation in Vacuum, 1998. Proceedings ISDEIV. XVIIIth International Symposium on
Conference_Location :
Eindhoven
Print_ISBN :
0-7803-3953-3
DOI :
10.1109/DEIV.1998.740615