• DocumentCode
    332402
  • Title

    Experimental analysis of the electrode products emitted by high-current vacuum arcs

  • Author

    Kutzner, J. ; Batura, R. ; Stachowiak, Z.

  • Author_Institution
    Inst. of Electr. Power Eng., Poznan Univ. of Technol., Poland
  • Volume
    1
  • fYear
    1998
  • fDate
    17-21 Aug 1998
  • Firstpage
    278
  • Abstract
    The mass distribution of particles produced in the high-current vacuum arc was investigated. The experiments were concentrated on evaluating the spatial mass distribution emitted in radial as well as in azimuthal directions calculated from mass deposition profile on the collectors surrounding the arc discharge. The experiments were carried out in a vacuum chamber evacuated to ambient pressure <10-4 Pa. The high-current arcs in the range from 2 kA to 7.5 kA were drawn between butt contacts of 31 and 55 mm in diameter (anode and cathode respectively) both of copper-chromium alloy (CuCr25). The surface mass deposit along the multi-segment collectors were measured by micro-densitometer, a scanning microscope and also by ICP spectrometer. Two angular mass deposit distributions were determined: the azimuthal distribution represented by function fm(β) on the plane parallel to the cathode surface; and the radial distribution fmc) as a function of angle φc with respect to the cathode plane. Both distributions are anisotropic and the structure of the deposition layer depends on the angle of particles incident upon the substrate, the density of particles flux and other factors. The component of mass deposit on collectors consists mostly the chromium molecules (approx. 80% of Cr and 20% Cu) for CuCr25 or CuCr40 electrodes
  • Keywords
    anodes; cathodes; chromium alloys; copper alloys; densitometry; electrical contacts; scanning electron microscopy; spectrometers; surface chemistry; vacuum arcs; 2 to 7.5 kA; 31 mm; 55 mm; CuCr; ICP spectrometer; anode; arc discharge; azimuthal distribution; butt contacts; cathode; deposition layer structure; electrode products; high-current vacuum arcs; mass deposition profile; micro-densitometer; multi-segment collectors; particles flux density; radial distribution; scanning microscope; spatial mass distribution; surface mass deposit; vacuum chamber; Anisotropic magnetoresistance; Anodes; Arc discharges; Cathodes; Chromium; Copper alloys; Electrodes; Mass spectroscopy; Microscopy; Vacuum arcs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Discharges and Electrical Insulation in Vacuum, 1998. Proceedings ISDEIV. XVIIIth International Symposium on
  • Conference_Location
    Eindhoven
  • ISSN
    1093-2941
  • Print_ISBN
    0-7803-3953-3
  • Type

    conf

  • DOI
    10.1109/DEIV.1998.740625
  • Filename
    740625