Title :
Comparison of Antireflective Characteristics between Square Pillar and Columned Sub-Wavelength Structures
Author :
Xu Qiyuan ; Liu Zhengtang ; Li Yangping ; Wu Qian ; Zhang Shaofeng
Author_Institution :
State Key Lab. of Solidification Process., Northwestern Polytech. Univ., Xi´an, China
Abstract :
In order to compare antireflective characteristics between square pillar and columned sub-wavelength structures (SWSs), the relationships between diffraction efficiency and major structural parameters were examined by rigorous coupled-wave analysis (RCWA) on Ge substrate. The results showed square pillar and columned SWSs all had a good antireflective property; Filling factor and structural depth were the major parameters, which affected the antireflective characteristics of SWSs; The smaller the period, the better the antireflective characteristics of SWSs; The surface shape of the SWSs had a great effect on reflectivity when filling factor or structural depth was big; Square pillar SWSs had a better antireflective characteristic than columned of SWSs when the period was big.
Keywords :
antireflection coatings; elemental semiconductors; germanium; light diffraction; optical materials; reflectivity; surface structure; Ge; Ge substrate; antireflective characteristics; columned subwavelength structures; diffraction efficiency; filling factor; reflectivity; rigorous coupled-wave analysis; square pillar structures; structural depth; surface shape; Filling; Optical surface waves; Optimized production technology; Reflectivity; Substrates; Surface treatment; System-on-a-chip;
Conference_Titel :
Photonics and Optoelectronics (SOPO), 2011 Symposium on
Conference_Location :
Wuhan
Print_ISBN :
978-1-4244-6555-2
DOI :
10.1109/SOPO.2011.5780401