Title :
Fabrication of micrometer-sized conical field emitters using femtosecond laser-assisted etching of silicon
Author :
Carey, J.E. ; Crouch, C.H. ; Younkin, R. ; Mazur, E. ; Sheehy, M. ; Friend, C.
Author_Institution :
Div. of Eng. & Appl. Sci., Harvard Univ., Cambridge, MA, USA
Abstract :
Arrays of sharp, conical microstructures were obtained by structuring the surface of a silicon wafer using femtosecond laser-assisted etching. Analysis of the arrays shows high, stable field emission without any further processing steps and turn-on fields as low as 1.3 V/μm
Keywords :
electron field emission; elemental semiconductors; laser beam etching; silicon; vacuum microelectronics; Si; conical microstructure; fabrication; femtosecond laser-assisted etching; field emitter array; silicon wafer surface; turn-on field; Chemical lasers; Current-voltage characteristics; Electrons; Etching; Laser theory; Microstructure; Optical device fabrication; Physics; Silicon; Surface emitting lasers;
Conference_Titel :
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location :
Davis, CA
Print_ISBN :
0-7803-7197-6
DOI :
10.1109/IVMC.2001.939660
