• DocumentCode
    3326802
  • Title

    Fabrication of micrometer-sized conical field emitters using femtosecond laser-assisted etching of silicon

  • Author

    Carey, J.E. ; Crouch, C.H. ; Younkin, R. ; Mazur, E. ; Sheehy, M. ; Friend, C.

  • Author_Institution
    Div. of Eng. & Appl. Sci., Harvard Univ., Cambridge, MA, USA
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    75
  • Lastpage
    76
  • Abstract
    Arrays of sharp, conical microstructures were obtained by structuring the surface of a silicon wafer using femtosecond laser-assisted etching. Analysis of the arrays shows high, stable field emission without any further processing steps and turn-on fields as low as 1.3 V/μm
  • Keywords
    electron field emission; elemental semiconductors; laser beam etching; silicon; vacuum microelectronics; Si; conical microstructure; fabrication; femtosecond laser-assisted etching; field emitter array; silicon wafer surface; turn-on field; Chemical lasers; Current-voltage characteristics; Electrons; Etching; Laser theory; Microstructure; Optical device fabrication; Physics; Silicon; Surface emitting lasers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
  • Conference_Location
    Davis, CA
  • Print_ISBN
    0-7803-7197-6
  • Type

    conf

  • DOI
    10.1109/IVMC.2001.939660
  • Filename
    939660
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3326802