• DocumentCode
    3327138
  • Title

    Breakdown Voltage and On-Resistance Comparison of IGBTs Based on 4H-SiC and Si

  • Author

    Yuan, Shoucai ; Zhang, Yi

  • Author_Institution
    Sch. of Phys. & Electron. Inf., GanNan Normal Univ., Ganzhou, China
  • fYear
    2011
  • fDate
    16-18 May 2011
  • Firstpage
    1
  • Lastpage
    3
  • Abstract
    In order to compare the performance differences between power IGBTs fabricated with 4H-SiC and Si, the basic theory of semiconductor physics for 4H-SiC and Si is used to describe the quantitative relationship between their epilayer doping concentration, epilayer thickness, on-resistance and breakdown voltage, the MATLAB software is used to calculate the comparison curves. For devices with breakdown voltage of 2000V, the calculation results show that the epilayer doping concentration for 4H-SiC is one order of magnitude higher than that of Si, while the epilayer thickness and corresponding on resistance are only about 15 percent that of Si. So our research indicates that the 4H-SiC devices will have higher epilayer doping concentration and smaller epilayer thickness as well as lower on-resistance when compared with that of silicon devices.
  • Keywords
    doping profiles; electric breakdown; electrical resistivity; elemental semiconductors; insulated gate bipolar transistors; power semiconductor devices; semiconductor epitaxial layers; silicon; silicon compounds; wide band gap semiconductors; IGBT; MATLAB software; Si; SiC; breakdown voltage; doping concentration; epilayer thickness; on-resistance; Doping; Epitaxial layers; Insulated gate bipolar transistors; Power semiconductor devices; Resistance; Silicon; Silicon carbide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics and Optoelectronics (SOPO), 2011 Symposium on
  • Conference_Location
    Wuhan
  • ISSN
    2156-8464
  • Print_ISBN
    978-1-4244-6555-2
  • Type

    conf

  • DOI
    10.1109/SOPO.2011.5780549
  • Filename
    5780549