High accuracy electron beam model development in michelle: Ebeam

Author

Ovtchinnikov, S. ; Shtokhamer, R. ; Mkrtchyan, M. ; Kostas, C. ; Petillo, J. ; Cooke, S. ; Vlasov, A. ; Levush, B.

Author_Institution

Sci. Applic. Int´´l Corp., Billerica, MA, USA

fYear

2010

fDate

20-24 June 2010

Firstpage

1

Lastpage

1

Abstract

We present a new MICHELLE software module (eBEAM) that is capable of high accuracy simulations of electron beams with stochastic space charge effects. In modeling low current electron beam systems such as electron beam lithography, nanolithography and electron microscopy, it is necessary to simulate ensembles of individual electrons to account correctly for the statistical effects of inter-particle interactions. The MICHELLE-eBEAM simulation is accomplished via a CPU/GPU hybrid code that runs on multiple platforms.

Keywords

plasma collision processes; plasma simulation; space charge; stochastic processes; CPU hybrid code; GPU hybrid code; MICHELLE software module; MICHELLE-eBEAM simulation; electron beam lithography; electron beam nanolithography; electron microscopy; high accuracy electron beam model; high accuracy simulation; interparticle interaction; low current electron beam system; stochastic space charge effects; Application software; Computational modeling; Electron beams; Electron microscopy; Laboratories; Lithography; Nanolithography; Space charge; Space technology; Stochastic processes;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 2010 Abstracts IEEE International Conference on

Conference_Location

Norfolk, VA

ISSN

0730-9244

Print_ISBN

978-1-4244-5474-7

Electronic_ISBN

0730-9244

Type

conf

DOI

10.1109/PLASMA.2010.5533889

Filename

5533889