DocumentCode :
3327246
Title :
Behavior of the solid-state field-controlled planar emitters under extreme working conditions
Author :
Binh, Vu Thien ; Semet, V. ; Dupin, J.P. ; Adessi, Ch. ; Guillot, D.
Author_Institution :
DPM-CNRS, Univ. Lyon, Villeurbanne, France
fYear :
2001
fDate :
2001
Firstpage :
133
Abstract :
Summary form only given. Solid-state field-controlled emission (SSE) cold cathodes present electron emission characteristics, different from the conventional thermionic and field emissions, that are of interest for numerous applications in vacuum microelectronics. The SSE cold cathode structure is characterized by the presence of an ultrathin layer of a large-bandgap semiconductor (UTSC) of few nanometer thickness deposited on a metallic surface. For the SSE, we have proposed a serial two-step mechanism based on the formation of a large space charge injected into the UTSC to create a surface with low or negative electron affinity (Vu Thien Binh et al, Phys. Rev. Lett. vol. 85, pp. 864-867, 2000). The electron emission is then regulated by applying an electric field, in the range of 100 V/μm, in order to control the height and the thickness of the surface barrier. In this study, we address the emission properties of planar SSE cold cathodes, with particular emphasis on the upper limits with regard to the emission currents and the working pressures
Keywords :
cathodes; electric current; electric fields; electron field emission; semiconductor thin films; vacuum microelectronics; wide band gap semiconductors; LJTSC; SSE cold cathode structure; electric field; electron emission; electron emission characteristics; electron emission regulation; emission currents; emission properties; field emissions; metallic surface; negative electron affinity; planar SSE cold cathodes; serial two-step mechanism; solid-state field-controlled emission cold cathodes; solid-state field-controlled planar emitters; space charge formation; space charge injection; surface barrier height; surface barrier thickness; thermionic emissions; ultrathin large-bandgap semiconductor layer; working pressures; Cathodes; Electron emission; Electron guns; Employee welfare; Explosives; Microelectronics; Solid state circuits; Space charge; Thermionic emission; Thickness control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International
Conference_Location :
Davis, CA
Print_ISBN :
0-7803-7197-6
Type :
conf
DOI :
10.1109/IVMC.2001.939689
Filename :
939689
Link To Document :
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