A modified lift-off method for fabricating monolithic thin-film edge emitter display

Author

Bhatia, V. ; Karpov, L.D. ; Kim, H.R. ; Weichold, M.H.

Author_Institution

Dept. of Electr. Eng., Texas A&M Univ., College Station, TX, USA

fYear

2001

fDate

2001

Firstpage

147

Lastpage

148

Abstract

A modified lift-off method for fabricating monolithic thin-film edge-emitter displays (MT-FEED) using two layers of photoresist separated by a metal film has been developed. Several different experimental structures were fabricated by varying the thickness of dielectric layer that separates anode lines from cathode lines from 3 to 6 microns. The technology is viable for fabricating MT-FEEDs with thin-film phosphors deposited on the anode lines. This is possible since following the complete fabrication of structures, photoresist pillars are lifted-off using solvents that provide no damage to the thin-film phosphor. The technique developed for the fabrication of MT-FEED is simple and reduces the number of steps involved during the fabrication and hence can be successfully used for other edge-emitter devices

Keywords

field emission displays; phosphors; photoresists; thin film devices; MT-FEED; anode line; cathode line; dielectric layer; fabrication; field emission display; lift-off method; metal film; monolithic thin-film edge emitter display; photoresist pillar; thin-film phosphor; Anodes; Cathodes; Dielectric thin films; Displays; Fabrication; Phosphors; Resists; Solvents; Sputtering; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Microelectronics Conference, 2001. IVMC 2001. Proceedings of the 14th International

Conference_Location

Davis, CA

Print_ISBN

0-7803-7197-6

Type

conf

DOI

10.1109/IVMC.2001.939696

Filename

939696